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Search for: [Description = "This paper reports a test structure for characterization of a new technology combining a standard CMOS process with pixel detector manufacturing technique. These processes are combined on a single thick\-_lm SOI wafer. Preliminary results of the measurements performed on both MOS SOI transistors and dedicated SOI test structures are described in detail."]

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Tomaszewski, Daniel Jaroszewicz, Bohdan Grabiec, Piotr Marczewski, Jacek Barański, Mateusz Domański, Krzysztof Kucharski, Krzysztof Kucewicz, Wojciech Grodner, Mirosław Sapor, Maria Kociubiński, Andrzej Niemiec, Halina

2005, nr 1
artykuł

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