@misc{Jakubowski_Andrzej_Composition,
 author={Jakubowski, Andrzej and Beck, Romuald B. and Ćwil, Michał and Konarski, Piotr and Bieniek, Tomasz and Schmeißer, Dieter and Hoffmann, Patrick},
 howpublished={online},
 publisher={Instytut Łączności - Państwowy Instytut Badawczy, Warszawa},
 language={ang},
 title={Composition and electrical properties of ultra-thin SiOxNy layers formed by rf plasma nitrogen implantation/plasma oxidation processes, Journal of Telecommunications and Information Technology, 2007, nr 3},
 type={artykuł},
 keywords={oxynitride, CMOS, gate stack, plasma implantation},
}