@misc{Beck_Romuald_B._Comparison,
 author={Beck, Romuald B. and Ćwil, Michał and Konarski, Piotr and Bieniek, Tomasz and Schmeißer, Dieter and Hoffmann, Patrick and Mroczyński, Robert},
 howpublished={online},
 publisher={Instytut Łączności - Państwowy Instytut Badawczy, Warszawa},
 language={ang},
 title={Comparison of composition of ultra-thin silicon oxynitride layers’ fabricated by PECVD and ultrashallow rf plasma ion implantation, Journal of Telecommunications and Information Technology, 2007, nr 3},
 type={artykuł},
 keywords={oxynitride, PECVD, ultra-thin dielectrics, SIMS, XPS},
}