@misc{Beck_Romuald_B._The,
 author={Beck, Romuald B. and Ćwil, Michał and Kalisz, Małgorzata and Barcz, Adam},
 howpublished={online},
 publisher={Instytut Łączności - Państwowy Instytut Badawczy, Warszawa},
 language={ang},
 title={The role of fluorine-containing ultra-thin layer in controlling boron thermal diffusion into silicon, Journal of Telecommunications and Information Technology, 2007, nr 3},
 type={artykuł},
 keywords={fluorine, boron thermal diffusion, fluorocarbon plasma, reactive ion etching, silicon fluoride},
}