@misc{Schwalke_Udo_Gate,
 author={Schwalke, Udo},
 howpublished={online},
 publisher={Instytut Łączności - Państwowy Instytut Badawczy, Warszawa},
 language={ang},
 title={Gate dielectrics: process integration issues and electrical properties, Journal of Telecommunications and Information Technology, 2005, nr 1},
 type={artykuł},
 keywords={high-k dielectrics, CMOS, Pr2O3, wet chemical cleaning, RIE, process integration, wet chemical etching, resist removal},
}