@misc{Jakubowski_Andrzej_Ultrathin,
 author={Jakubowski, Andrzej and Beck, Romuald B.},
 howpublished={online},
 publisher={Instytut Łączności - Państwowy Instytut Badawczy, Warszawa},
 language={ang},
 title={Ultrathin oxynitride films for CMOS technology, Journal of Telecommunications and Information Technology, 2004, nr 1},
 type={artykuł},
 keywords={gate stack, MOS technology, plasma processing, ultrathin oxynitridelayers, high temperature processing},
}