@misc{Beck_Romuald_B._Novel,
 author={Beck, Romuald B. and Głuszko, Grzegorz and Kalisz, Małgorzata},
 howpublished={online},
 publisher={Instytut Łączności - Państwowy Instytut Badawczy, Warszawa},
 language={ang},
 title={Novel Method of Improving Electrical Properties of Thin PECVD Oxide Films by Fluorination of Silicon Surface Region by RIE in RF CF4 Plasma, Journal of Telecommunications and Information Technology, 2010, nr 1},
 type={artykuł},
 keywords={radio frequency reactive ion etching, current-voltagecharacteristics, capacitance-voltage characteristics, fluorine plasma},
}