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Search for: [Subject and Keywords = "gate stack"]

Number of results: 5

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Composition and electrical properties of ultra-thin SiOxNy layers formed by rf plasma nitrogen implantation/plasma oxidation processes, Journal of Telecommunications and Information Technology, 2007, nr 3

Jakubowski, Andrzej Beck, Romuald B. Ćwil, Michał Konarski, Piotr Bieniek, Tomasz Schmeißer, Dieter Hoffmann, Patrick

2007, nr 3
artykuł
Applying shallow nitrogen implantation from rf plasma for dual gate oxide technology, Journal of Telecommunications and Information Technology, 2007, nr 3

Jakubowski, Andrzej Beck, Romuald B. Ćwil, Michał Głuszko, Grzegorz Konarski, Piotr Bieniek, Tomasz

2007, nr 3
artykuł
Semiconductor cleaning technology for next generation material systems, Journal of Telecommunications and Information Technology, 2007, nr 2

Ruzyllo, Jerzy

2007, nr 2
artykuł
Ultrathin oxynitride films for CMOS technology, Journal of Telecommunications and Information Technology, 2004, nr 1

Jakubowski, Andrzej Beck, Romuald B.

2004, nr 1
artykuł
Challenges in scaling of CMOS devices towards 65 nm node, Journal of Telecommunications and Information Technology, 2005, nr 1

Jurczak, Małgorzata Rotschild, Aude Severi, Simone Keersgieter de, An Henson, Kirklen Mertens, Sofie Rooyackers, Rita Pollentier, Ivan Scaekers, Marc Lindsay, Richard Lauwers, Anne Augendre, Emmanuel Veloso, Anabela

2005, nr 1
artykuł

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