Filters
  • Collections
  • Group objects
  • File type
  • Creator
  • Subject and Keywords
  • Date
  • Resource Type
  • Language

Search for: [Title = "The Effect of High Temperature Annealing on Fluorine Distribution Profile and Electro\-Physical Properties of Thin Gate Oxide Fluorinated by Silicon Dioxide RIE in CF4 Plasma, Journal of Telecommunications and Information Technology, 2010, nr 1"]

Number of results: 1

Items per page:

This page uses 'cookies'. More information