III-V compounds, FinFET, IC manufacturing, MEMS, MOS gate stack, semiconductor cleaning ; semiconductor cleaning ; IC manufacturing ; MEMS ; MOS gate stack ; FinFET
Description: Publisher:Instytut Łączności - Państwowy Instytut Badawczy, Warszawa
Date: Resource Type: Format: DOI: ISSN: eISSN: Source:Journal of Telecommunications and Information Technology
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