Title:

Electron mobility and drain current in strained-Si MOSFET, Journal of Telecommunications and Information Technology, 2007, nr 3

Creator:

Walczak, Jakub ; Majkusiak, Bogdan

Subject and Keywords:

electron mobility ; strained-Si MOSFET

Description:

Electron mobility and drain current in a strained-Si MOSFET have been calculated and compared with the mobility and drain current obtained for the relaxed material. In the first step, our mobility model has been calibrated to the “universal mobility” according to the available experimental data for unstrained Si MOSFETS. Then, employing the mobility parameters derived in the calibration process, electron mobility and the drain current have been calculated for strained-Si MOSFETs.

Publisher:

Instytut Łączności - Państwowy Instytut Badawczy, Warszawa

Date:

2007, nr 3

Resource Type:

artykuł

Format:

application/pdf

DOI:

10.26636/jtit.2007.3.835

ISSN:

1509-4553

eISSN:

1899-8852

Source:

Journal of Telecommunications and Information Technology

Language:

ang

Rights Management:

Biblioteka Naukowa Instytutu Łączności