Title:

Comparison of gate leakage current components in metal-insulator-semiconductor structures with high-k gate dielectrics, Journal of Telecommunications and Information Technology, 2001, nr 1

Creator:

Jakubowski, Andrzej ; Majkusiak, Bogdan ; Korwin-Pawłowski, Michał ; Janik, Tomasz

Subject and Keywords:

high-k di-electrics ; MIS structures ; ultrathin dielectrics

Description:

Numerical simulations of the gate leakage current in metal-insulator-semiconductor (MIS) structures based on the transfer matrix approach were carried out. They show contribution of different components of this current in MIS structures with best known high-k dielectrics such as Ta2O5 and TiO2. The comparison of the gate leakage current in MIS structures with SiO2 layer as well Ta2O5 and TiO2 layers is presented as well. Additionally, the minimum Si electron affinity to a gate dielectric which allows to preserve given level of the gate leakage current is proposed.

Publisher:

Instytut Łączności - Państwowy Instytut Badawczy, Warszawa

Date:

2001, nr 1

Resource Type:

artykuł

Format:

application/pdf

Resource Identifier:

ISSN 1509-4553, on-line: ISSN 1899-8852

DOI:

10.26636/jtit.2001.1.38

ISSN:

1509-4553

eISSN:

1899-8852

Source:

Journal of Telecommunications and Information Technology

Language:

ang

Rights Management:

Biblioteka Naukowa Instytutu Łączności