Title:

Ellipsometric spectroscopy studies of compaction and decompaction of Si-SiO2 systems, Journal of Telecommunications and Information Technology, 2007, nr 3

Creator:

Rzodkiewicz, Witold ; Panas, Andrzej

Subject and Keywords:

spectroscopic ellipsometry ; Si-SiO2 system ; refractive index ; density

Description:

The influence of the strain on the optical properties of Si-SiO2 system has been investigated by spectroscopic ellipsometry (SE), interferometry and weighing methods. Subtle changes of densification (compaction degree) in silicon dioxide layers on silicon substrates have been determined by weight technique (relying on measurements of the silicon dioxide layer mass and calculations of the volume). Elastic stress in the oxide layers has been measured by Fizeau fringes image analysis method. A comparison is made between the density of the silicon dioxide (r) and the results of calculations made using r = f = (n) relations (where n is the refractive index) given in the literature.

Publisher:

Instytut Łączności - Państwowy Instytut Badawczy, Warszawa

Date:

2007, nr 3

Resource Type:

artykuł

Format:

application/pdf

DOI:

10.26636/jtit.2007.3.828

ISSN:

1509-4553

eISSN:

1899-8852

Source:

Journal of Telecommunications and Information Technology

Language:

ang

Rights Management:

Biblioteka Naukowa Instytutu Łączności