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Title: Ellipsometric spectroscopy studies of compaction and decompaction of Si-SiO2 systems, Journal of Telecommunications and Information Technology, 2007, nr 3

Creator:

Rzodkiewicz, Witold ; Panas, Andrzej

Date:

2007, nr 3

Resource Type:

artykuł

Description:

The influence of the strain on the optical properties of Si-SiO2 system has been investigated by spectroscopic ellipsometry (SE), interferometry and weighing methods. Subtle changes of densification (compaction degree) in silicon dioxide layers on silicon substrates have been determined by weight technique (relying on measurements of the silicon dioxide layer mass and calculations of the volume). Elastic stress in the oxide layers has been measured by Fizeau fringes image analysis method. A comparison is made between the density of the silicon dioxide (r) and the results of calculations made using r = f = (n) relations (where n is the refractive index) given in the literature.

Publisher:

Instytut Łączności - Państwowy Instytut Badawczy, Warszawa

Format:

application/pdf

Resource Identifier:

ISSN 1509-4553, on-line: ISSN 1899-8852 ; oai:bc.itl.waw.pl:285

Source:

Journal of Telecommunications and Information Technology

Language:

ang

Rights Management:

Biblioteka Naukowa Instytutu Łączności

Subject and keywords:

spectroscopic ellipsometry Si-SiO2 system refractive index density

Object collections:

Last modified:

Jan 27, 2010

In our library since:

Jan 27, 2010

Number of object content hits:

499

All available object's versions:

https://bc.itl.waw.pl/publication/328

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Edition name Date
Rzodkiewicz, Witold; Panas, Andrzej, Ellipsometric spectroscopy studies of compaction and decompaction of Si-SiO2 systems, Journal of Telecommunications and Information Technology, 2007, nr 3 Jan 27, 2010

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Instytut Łączności – Państwowy Instytut Badawczy ul. Szachowa 1 04-894 Warszawa

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(+48) 5128 696

E-Mail

biblioteka@il-pib.pl

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