Jakubowski, Andrzej ; Beck, Romuald B. ; Bieniek, Tomasz ; Kudła, Andrzej
Subject and Keywords:shallow implantation ; MOS technology ; radiation damage ; plasma processing
Description: Publisher:Instytut Łączności - Państwowy Instytut Badawczy, Warszawa
Date: Resource Type: Format: DOI: ISSN: eISSN: Source:Journal of Telecommunications and Information Technology
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