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Title: Novel Method of Improving Electrical Properties of Thin PECVD Oxide Films by Fluorination of Silicon Surface Region by RIE in RF CF4 Plasma, Journal of Telecommunications and Information Technology, 2010, nr 1

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Last modified:

Oct 5, 2010

In our library since:

Oct 5, 2010

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117

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https://bc.itl.waw.pl/publication/849

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