Advanced search ?

Object

Download

Title: Evaluation of MOSFETs with crystalline high-k gate-dielectrics: device simulation and experimental data, Journal of Telecommunications and Information Technology, 2007, nr 2

Creator:

Schwalke, Udo ; Zaunert, Florian ; Endres, Ralf ; Stefanov, Yordan

Date:

2007, nr 2

Resource Type:

artykuł

Description:

The evaluation of the world’s first MOSFETs with epitaxially-grown rare-earth high-k gate dielectrics is the main issue of this work. Electrical device characterization has been performed on MOSFETs with high-k gate oxides as well as their reference counterparts with silicon dioxide gate dielectric. In addition, by means of technology simulation with TSUPREM4, models of these devices are established. Current-voltage characteristics and parameter extraction on the simulated structures is conducted with the device simulator MEDICI. Measured and simulated device characteristics are presented and the impact of interface state and fixed charge densities is discussed. Device parameters of high-k devices fabricated with standard poly-silicon gate and replacement metal gate process are compared.

Publisher:

Instytut Łączności - Państwowy Instytut Badawczy, Warszawa

Format:

application/pdf

Resource Identifier:

oai:bc.itl.waw.pl:270

DOI:

10.26636/jtit.2007.2.812

ISSN:

1509-4553

eISSN:

1899-8852

Source:

Journal of Telecommunications and Information Technology

Language:

ang

Rights Management:

Biblioteka Naukowa Instytutu Łączności

Subject and keywords:

MEDICI gadolinium oxide praseodymium oxide crystalline high-k gate dielectric remote coulomb scattering TSUPREM4 interface state density carrier mobility CMP CMOS process damascene metal gate rare-earth oxide

Object collections:

Last modified:

Jul 24, 2024

In our library since:

Jan 22, 2010

Number of object content hits:

184

All available object's versions:

https://bc.itl.waw.pl/publication/312

Show description in RDF format:

RDF

Show description in OAI-PMH format:

OAI-PMH

Edition name Date
Zaunert, Florian; Endres, Ralf; Stefanov, Yordan; Schwalke, Udo, Evaluation of MOSFETs with crystalline high-k gate-dielectrics: device simulation and experimental data, Journal of Telecommunications and Information Technology, 2007, nr 2 Jul 24, 2024

Objects Similar
Gate dielectrics: process integration issues and electrical properties, Journal of Telecommunications and Information Technology, 2005, nr 1

Schwalke, Udo

2005, nr 1
artykuł
More
×

Citation

Citation style:

Contact details

Address

Instytut Łączności – Państwowy Instytut Badawczy ul. Szachowa 1 04-894 Warszawa

Phone

(+48) 5128 696

E-Mail

biblioteka@il-pib.pl

Visit us!

This page uses 'cookies'. More information